Vapor-solid interfacial reaction and polymerization for wafer-scale uniform and ultrathin two-dimensional organic films

Chemical vapor deposition is a conventional synthesis method for growing large-scale and high-quality two-dimensional materials, such as graphene, hexagonal boron nitride, transition-metal dichalcogenides. For organic films, solution-based methods, inkjet printing, spin coating, drop micro-contact are commonly used. Herein, we demonstrate general wafer-scale continuous, uniform, ultrathin (2–5 nm) films. This based on copper (Cu) surface-mediated reaction polymerization of several equivalent bromine (Br)-containing π-conjugated small molecules (C12S3Br6, C24H4O2Br2, C24H12Br2N4), in which local internal π-π interactions among responsible the dimension uniformity control thin Specifically, growth rate morphology films were found to be Cu-facet-dependent, single-crystal Cu(111) surfaces could improve In addition, number Br groups size critical crystallinity thin-film formation. can used fabricate heterostructures, film/graphene, giving room various functional materials device applications.